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KMID : 0362419930310040661
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Journal of Korean Academy of Prosthodontics
1993 Volume.31 No. 4 p.661 ~ p.678
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Photoelastic analysis of stress induced by different type endosseous implants
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Chung Chae-Heon
Chang Doo-Ik
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Abstract
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The purpose of this study was to analyze the stress distribution at supporting bone according to the types of endosseous implants. @ES The results were as follows: @EN 1. Under the vertical load, screw implants of Steri-Oss and Branemark showed increasing stress condition between and around the screw threads along the implant lateral surface and cylindrical implant of IMZ showed the less stress condition along the lateral surface with concentration of stress mostly near the root apex.
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